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Jan 1 |
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| Time | Subject | Speaker |
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| 9:30 - 9:40 |
Welcome Remarks |
Jeff Graham U.S. Consulate General in Shanghai Deputy Principal Officer |
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| 9:40 - 10:00 |
Reference of high TDS waste water treatment and ZLD technology in Industry Sectors |
Tom Tseng Aquatech (Guangzhou) Water Treatment Co. Ltd |
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| 10:00 - 10:20 |
Linde Ozone Vent Gas Reuse Technology in Wastewater Treatment |
Shi Yan Praxair China |
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| 10:00 - 10:20 |
Cryogenic VOC condensation system for material recovery and emission control |
Qi Yunfei Praxair China |
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| 10:20 - 10:40 |
Oder Control in Waste Water and Exhaust Air Treatment in Chemical Industrial Park |
Gu Yan Purafil Inc |
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| 10:40 - 11:05 |
Total Solutions of Environmental Monitoring in Industry Park |
Yu Hui Thermo Fisher Scientific Co., Ltd. |
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| 11:05 - 11:25 |
Xylem's Wastewater Solutions for iIndustrial Park |
Bai Yuntao Xylem |
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| 11:25 - 11:45 |
Hach China Industrial Park Waste Water Treatment Legal Risk Control Solution |
Shi Zhengchun Hach Water Quality Analytical Instruments (Shanghai) Co., Ltd |
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| 11:45 - 12:00 |
Networking Reception |
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- (021) 2352 1111
- (021) 2352 1088
- ieexpo@mm-zm.com